Photolithographically Patterned and Highly Stable Electrochromic Display Enabled by a Photo-assist Cross-linker

Chenchao Huang,Yuan-Qiu-Qiang Yi,Zishou Hu,Shuo Zhang,Xinzhou Wu,Xiaolian Chen,Wenya Xu,Wenming Su,Zheng Cui
DOI: https://doi.org/10.1039/d3tc03088a
IF: 6.4
2023-10-19
Journal of Materials Chemistry C
Abstract:Photolithography is a standard technique for high resolution patterning of electronic devices. This study presents a new tris-diazo compound (X8) as a carbene crosslinker which responds to UV photons and can be directly patterned by photolithography. The tris-diazo compound (X8) has been successfully applied to fabricate solution-processable electrochromic polymer (ECP) displays. Upon exposed to UV light of 254 nm wavelength, the blend of X8 (≤5wt%) with ECP (PProDOT, poly(3,4-propylenedioxythiophene)) can cross-link, exhibiting a ~93% solvent resistance whereas the pristine PProDOT does not cross-link at all. The electrochromic devices (ECDs) based on the crosslinked PProDOT showed exceptional stability of 300,000 operational cycles, with both the bleaching and coloring time at 0.5 s without obvious deterioration. With lithographical patterning, minimum 50 mm size of display pixel has been realized, which paves the way for future large area and low cost electrochromic display applications.
materials science, multidisciplinary,physics, applied
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