Abstract:Block copolymer (BCP) nanolithography provides an economical way to pattern nanoscale features for the semiconductor industry. Molecular cyclization can reduce feature sizes, but like linear BCPs, cyclic BCP nanostructure size is limited by the order-disorder transition (ODT). Although the ODTs of pure linear and cyclic BCPs have been studied extensively, there is little information on binary blends of these BCPs. Here, we use dissipative particle dynamic simulations to study the impact of size mismatch and molecular architecture of component BCPs on the ODT for various blends. We see that the blend ODT always occurs at higher segregation strength than one would predict from linear interpolation between pure-component ODTs. The deviation from this simple prediction is greater for blends with greater size mismatch between components. We find clustering of like components (i.e., linear BCPs with linear BCPs and cyclic BCPs with cyclic BCPs) in the disordered phase, and the characteristic lengths of the component clusters correlate with molecular size. Because the ordered state consists of uniformly spaced lamellae, which requires interdigitation of linear and cyclic components of the blend, resolution of the size mismatch between clusters seen in the disordered state can be thought of as a barrier to ordering. https://doi.org/10.1103/PhysRevMaterials.8.045603 Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI. Published by the American Physical Society This article appears in the following collection: The Editors of Physical Review Materials are pleased to present the Collection on Self-Assembly of Complex Phases in Block Copolymer Materials, highlighting one of the most exciting fields in polymer science. Block copolymers offer an excellent model system for comprehending symmetry breaking in soft matter, as well as a unique platform for designing nanostructured materials. This Collection is being guest-edited by Kevin Dorfman from the University of Minnesota and Chris Bates from the University of California - Santa Barbara.

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