Plasma- and vacuum-ultraviolet (VUV) photo-polymerisation of bioactive organic coatings : stability in polar solvents and in air

J. Ruiz,A. St-Georges-Robillard,S. Poulin,S. Lerouge,M. Wertheimer

Abstract:We have investigated amine([–NH2])-rich coatings in various cell-culture applications for several years, depositing films by plasma polymerisation from ethylene (C2H4)-N2 or C2H4–NH3 mixtures, respectively. More recently, vacuum-ultraviolet(VUV, < 200 nm) assisted photo-polymerisation has proven highly advantageous: Employing quasi-monochromatic Kr and Xe VUV sources, we have found the latter to possess particularly high [-NH2] values, presumably due to more specific and selective reactions induced by monoenergetic photons rather than by “hot” electrons, which are characterised by Maxwell-Boltzmann-like energy distributions. However, high concentration of [–NH2] groups and very low solubility in aqueous media tend to be mutually exclusive; for the best possible compromise, we select appropriate precursor gas-mixture ratios. We have now extended our investigations to O-containing organic deposits, again comparing photoand plasmaassisted polymerisation from C2H4–N2O, or C2H4–O2 (10% O2, diluted in Argon) gas mixtures, to verify that selective reaction pathways favouring high concentrations of the “desirable” –COOH or –OH functionalities exist, here too. All deposit types were characterised by XPS, FTIR, SEM and AFM, concentrations of particular functional groups being quantified via chemical derivatization, by reaction of toluidine blue O (TBO) with – COOH, and trifluoroacetic anhydride (TFAA) with -OH. As in the case of (–NH2), where the derivatizing reagent is 4-(trifluoromethyl)benzaldehyde (TFBA), experimental results tend to confirm that more selective reactions occur via the VUV route.