Concurrent control chart pattern recognition in manufacturing processes based on zero-shot learning

Yazhou Li,Wei Dai,Shuang Yu,Yihai He
DOI: https://doi.org/10.1016/j.isatra.2024.09.001
Abstract:In real industrial settings, collecting and labeling concurrent abnormal control chart pattern (CCP) samples are challenging, thereby hindering the effectiveness of current CCP recognition (CCPR) methods. This paper introduces zero-shot learning into quality control, proposing an intelligent model for recognizing zero-shot concurrent CCPs (C-CCPs). A multiscale ordinal pattern (OP) feature considering data sequential relationship is proposed. Drawing from expert knowledge, an attribute description space (ADS) is established to infer from single CCPs to C-CCPs. An ADS is embedded between features and labels, and the attribute classifier associates the features and attributes of CCPs. Experimental results demonstrate an accuracy of 98.73 % for 11 unseen C-CCPs and an overall accuracy of 98.89 % for all 19 CCPs, without C-CCP samples in training. Compared with other features, the multiscale OP feature has the best recognition effect on unseen C-CCPs.
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