Iron-binding characteristics of neuromelanin of the human substantia nigra.

K. Double,M. Gerlach,V. Schünemann,A. Trautwein,L. Zecca,M. Gallorini,M. Youdim,P. Riederer,D. Ben-Shachar

DOI: https://doi.org/10.1016/S0006-2952(03)00293-4

IF: 6.1

2003-08-01

Biochemical Pharmacology

Abstract:

What problem does this paper attempt to address?

Impact of UV Irradiation on Chlorella Sp. Damage and Disinfection Byproducts Formation During Subsequent Chlorination of Algal Organic Matter

Feilong Dong,Qiufeng Lin,Jing Deng,Tuqiao Zhang,Cong Li,Xuedong Zai

DOI: https://doi.org/10.1016/j.scitotenv.2019.03.282

IF: 9.8

2019-01-01

The Science of The Total Environment

Abstract:The frequent occurrence of algal blooms in surface water has attracted more and more attention, which caused many water quality problems, including disinfection byproducts (DBPs). Algal organic matter (AOM) including intracellular organic matter (IOM) and extracellular organic matter (EOM), was a well-known precursor to DBPs formation in drinking water. This study evaluated the effect of ultraviolet (UV) irradiation on the cell integrity, IOM release and DBPs formation during subsequent chlorination of Chlorella sp. Results showed the damage rates of algal cells increased to 40.1% after the high UV irradiation of 528 mJ/cm2, which contributed to the release of IOM. In addition, UV irradiation was effective in reducing the formation of haloacetic acids (HAAs) both in AOM and IOM, but promoted the formation of nitrogenous DBPs (N-DBPs) from AOM in subsequent chlorination. Furthermore, neutral pH exerted a positive effect on the formation of DBPs. UV irradiation decreased the bromine substitution factor (BSF) value of AOM at a high bromide level. The BSF values increased with increasing of the concentration of bromide. Moreover, more amino acids and low molecular weight precursors were produced after UV irradiation in filtered supernatant, which contributed to the formation of N-DBPs with algal chlorination. Overall, this information demonstrated pre-oxidation of UV irradiation could be used to treat the algal-rich drinking water.
The multiple roles of chlorite on the concentrations of radicals and ozone and formation of chlorate during UV photolysis of free chlorine

Jing Zhao,Chii Shang,Xinran Zhang,Xin Yang,Ran Yin

DOI: https://doi.org/10.1016/j.watres.2020.116680

2021-02-15

Abstract:Chlorine dioxide (ClO2) has emerged as a promising alternative to free chlorine for water disinfection and/or pre-oxidation due to its reduced yields of chlorinated disinfection byproducts. ClO2 decomposes to form chlorite (ClO2-), which influences the following advanced oxidation processes (AOPs) for micropollutant abatement in drinking water. This study aims at investigating the effects of ClO2- on the concentrations of reactive species (e.g., radicals and ozone) and on the formation of chlorate in the UV/chlorine AOP. Results showed that the concentration of ClO· in the UV/chlorine process remarkably decreased by 98.20-100.00% in the presence of ClO2- at concentration of 0.1-1.0 mg·L-1 as NaClO2. The concentrations of HO· and ozone decreased by 42.71-65.42% and by 22.02-64.31%, respectively, while the concentration of Cl· was less affected (i.e., 31.00-36.21% reduction). The overall concentrations of the reactive species were differentially impacted by ClO2-'s multiple roles in the process. UV photolysis of ClO2- generated HO· but not Cl·, ClO· or ozone under the drinking water relevant conditions. ClO2- also competed with chlorine for UV photons but this effect was minor (< 1.0%). The radicals/ozone scavenging by ClO2- outcompeted the above two to lead to the overall decreasing concentrations of the reactive species, in consistency with the kinetic model predicted trends. ClO2- reacted with radicals and ozone to form chlorate (ClO3-) but not perchlorate (ClO4-). HO· played a dominant role in ClO3- formation. The findings improved the fundamental understanding on micropollutant abatement and inorganic byproduct formation by the UV/chlorine process and other AOPs in ClO2--containing water.
Insights into the wavelength-dependent photolysis of chlorite: Elimination of carbamazepine and formation of chlorate

Jue Wang,Shumin Zhu,Yangtao Wu,Da Sheng,Lingjun Bu,Shiqing Zhou

DOI: https://doi.org/10.1016/j.chemosphere.2021.132505

IF: 8.8

Chemosphere

Abstract:Simultaneous removal of chlorite (ClO2-) and organic micro-pollutants (OMPs) by the irradiation of UV is a novel process. In this study we used UV light emitting diode (UV-LED) as a new UV source to systematically investigate the effect of UV wavelength (255, 285, 365 nm) on the simultaneous removal of carbamazepine (CBZ) and ClO2-. Removal of both CBZ and ClO2- followed the order of 255, 285, and 365 nm. Formation of hydroxyl radical and reactive chlorine species (RCS) were confirmed during the photolysis of ClO2- using probe compounds. RCS were always the predominant contributor to the degradation of CBZ in UV-LED/ClO2- system. The impacts of ClO2- dosage, pH, bicarbonate/carbonate (HCO3-/CO32-), and the effect of natural organic matter (NOM) on CBZ degradation were also evaluated. This study identified the products produced by CBZ through possible degradation pathways during the transformation process. Further, the amount of ClO2- may affect the amount of chlorate produced in UV/ClO2- system. Overall, our research provides an in-depth analysis of the effects of UV wavelength on the simultaneous removal of ClO2- and OMPs in water.
Photolysis of Chlorine Dioxide under UVA Irradiation: Radical Formation, Application in Treating Micropollutants, Formation of Disinfection Byproducts, and Toxicity under Scenarios Relevant to Potable Reuse and Drinking Water

Yi-Hsueh Chuang,Kai-Lin Wu,Wei-Chun Lin,Hong-Jia Shi

DOI: https://doi.org/10.1021/acs.est.1c05707

2022-01-13

Abstract:Conversion of potable reuse water utilities and drinking water utilities from a low-pressure UV/H2O2 (LPUV/H2O2) advanced oxidation process (AOP) to alternative AOPs in which oxidants can effectively absorb photons and rapidly generate radicals has attracted great interest. Herein, we propose a novel UVA/ClO2 AOP for different water treatment scenarios because of reduced photon absorption by the background matrix and high molar absorptivity for ClO2 at UVA wavelengths. While the photolysis of ClO2 produces •Cl + O2 or •ClO + O(3P) via distinct product channels, we determined the parameters needed to accurately model the loss of oxidants and the formation of byproducts and combined a kinetic model with experimental data to determine quantum yields (Φ). Modeling incorporating the optimized Φ simultaneously predicted oxidant loss and the formation of major products -HOCl, Cl-, and ClO3-. We also systematically investigated the removal of three contaminants exhibiting different radical reactivities, the formation of 35 regulated and unregulated halogenated disinfection byproducts (DBPs), DBP-associated toxicity, and N-acetylcysteine thiol reactivity in synthetic or authentic RO permeates/surface waters treated by different AOPs. The kinetic model developed in this study was used to optimize operating conditions to control undesired products and improve contaminant removal efficiency. The results indicate that UVA/ClO2 can outperform LPUV/H2O2 in terms of electrical energy per order of contaminant degradation, disinfection byproduct formation, and toxicity indices.

environmental sciences,engineering, environmental
Micropollutant Abatement and Byproduct Formation During the Co-Exposure of Chlorine Dioxide (clo2) and UVC Radiation.

Qingqing Kong,Mengge Fan,Ran Yin,Xinran Zhang,Yu Lei,Chii Shang,Xin Yang

DOI: https://doi.org/10.1016/j.jhazmat.2021.126424

IF: 13.6

2021-01-01

Journal of Hazardous Materials

Abstract:Photolysis of ClO2 by UVC radiation occurs in several drinking water treatment scenarios (e.g., pre-oxidation by ClO2 with post-UVC disinfection or a multi-barrier disinfection system comprising ClO2 and UVC disinfection in sequence). However, whether micropollutants are degraded and undesired byproducts are formed during the co-exposure of ClO2 and UVC radiation remain unclear. This study demonstrated that four micropollutants (trimethoprim, iopromide, caffeine, and ciprofloxacin) were degraded by 14.4-100.0% during the co-exposure of ClO2 and UVC radiation in the synthetic drinking water under the environmentally relevant conditions (UV dose of 207 mJ cm(-2), ClO2 dose of 1.35 mg L-1, and pH of 7.0). Trimethoprim and iopromide were predominantly degraded by ClO2 oxidation and direct UVC photolysis, respectively. Caffeine and ciprofloxacin were predominantly degraded by the radicals (HO center dot and Cl-center dot) and the in-situ formed free chlorine from ClO2 photolysis, respectively. The yields of total organic chlorine (12.5 mu g L-1 from 1.0 mg C L-1 of NOM) and chlorate (0.14 mg L-1 From 1.35 mg L-1 of ClO2) during the co-exposure were low. However, the yield of chlorite was high (0.76 mg L-1 from 1.35 mg L-1 of ClO2), which requires attention and control.
Photochemical Transformation of Free Chlorine Induced by Triplet State Dissolved Organic Matter

Qingqing Kong,Lei Ye,Yanheng Pan,Yangjian Zhou,Yu Lei,Zihan Zeng,Siqi Chen,Liaoliao Yao,Xinran Zhang,Paul Westerhoff,Xin Yang

DOI: https://doi.org/10.1021/acs.est.3c02458

IF: 11.4

2023-01-01

Environmental Science & Technology

Abstract:Photolysis of free chlorine is an increasingly recognizedapproachfor effectively inactivating microorganisms and eliminating traceorganic contaminants. However, the impact of dissolved organic matter(DOM), which is ubiquitous in engineered water systems, on free chlorinephotolysis is not yet well understood. In this study, triplet stateDOM ((DOM)-D-3*) was found to cause the decay of free chlorinefor the first time. By using laser flash photolysis, the scavengingrate constants of triplet state model photosensitizers by free chlorineat pH 7.0 were determined to be in the range of (0.26-3.33)x 10(9) M-1 s(-1). (DOM)-D-3*, acting as a reductant, reacted with free chlorine atan estimated reaction rate constant of 1.22(& PLUSMN;0.22) x 10(9) M-1 s(-1) at pH 7.0. Thisstudy revealed an overlooked pathway of free chlorine decay duringUV irradiation in the presence of DOM. Besides the DOM's lightscreening ability and scavenging of radicals or free chlorine, (DOM)-D-3* played an important role in the decay of free chlorine.This reaction pathway accounted for a significant proportion of thedecay of free chlorine, ranging from 23 to 45%, even when DOM concentrationswere below 3 mg(C) L-1 and a free chlorinedose of 70 & mu;M was present during UV irradiation at 254 nm. Thegeneration of HO & BULL; and Cl-& BULL; fromthe oxidation of (DOM)-D-3* by free chlorine was confirmed byelectron paramagnetic resonance and quantified by chemical probes.By inputting the newly observed pathway in the kinetics model, thedecay of free chlorine in UV254-irradiated DOM solutioncan be well predicted. Thisstudy revealed the dominant role of (DOM)-D-3*as a reductant to react with free chlorine to generate reactive species.
Performance evaluation of the UV activated chlorite process on trimethoprim: Degradation efficiency, energy consumption and disinfection by-products formation

Wen-Kai Ye,Fu-Xiang Tian,Chen Chen,Jing Ye,Bo Wang,Xiao-Jun Hu,Bin Xu,Fu-wen Liu

DOI: https://doi.org/10.1016/j.chemosphere.2023.138540

IF: 8.8

2023-06-01

Chemosphere

Abstract:As the primary inorganic by-product species of ClO2, chlorite is believed to have negative toxicological effects on human health and therefrom greatly limits the wide application of ClO2 in water treatment. The synergistic trimethoprim (TMP) removal concerning degradation efficiency, energy consumption and disinfection by-products (DBPs) formation in the UV activated chlorite process accompanied by the simultaneously elimination of chlorite was comprehensively evaluated. UV/chlorite integrated process removed TMP far more rapidly than UV (1.52%) or chlorite (3.20%) alone due to the endogenous radicals (Cl•, ClO• and •OH), the contributing proportions of which were 31.96%, 19.20% and 44.12%. The second-order rate constants of TMP reaction with Cl•, ClO• and •OH were determined to be 1.75 × 1010, 1.30 × 109 and 8.66 × 109 M-1 s-1. The effects of main water parameters including chlorite dosage, UV intensity, pH as well as water matrixes (nature organic matter, Cl- and HCO3-) were examined. kobs obeyed the order as UV/Cl2>UV/H2O2≈UV/chlorite>UV, and the cost ranking via electrical energy per order (EE/O, kWh m-3 order-1) parameter was UV/chlorite (3.7034) > UV/H2O2 (1.1625) >UV/Cl2 (0.1631). The operational scenarios can be optimized to achieve the maximum removal efficiencies and the minimum energy costs. The destruction mechanisms of TMP were proposed by LC-ESI-MS analysis. The overall weighted toxicity in subsequent disinfection was assessed as UV/Cl2>UV/chlorite > UV, the values of which in post-chlorination were 6.2947, 2.5806 and 1.6267, respectively. Owing to the vital roles of reactive chlorine species (RCS), UV/chlorite displayed far higher TMP degradation efficiency than UV, and concurrently presented much less toxicity than UV/Cl2. In an effort to determine the viability of the promising combination technology, this study was devoted to reduce and reuse chlorite and synchronously realize the contaminants degradation efficiently.

environmental sciences
Refinement of kinetic model and understanding the role of dichloride radical (Cl2•−) in radical transformation in the UV/NH2Cl process

Haochen Zhang,Maoju Jiang,Peng Su,Qixiao Lv,Ge Zeng,Linqian An,Jiachun Cao,Yang Zhou,Shane Allen Snyder,Jun Ma,Tao Yang

DOI: https://doi.org/10.1016/j.watres.2024.121440

IF: 12.8

2024-05-01

Water Research

Abstract:The ultraviolet/monochloramine (UV/NH2Cl) process is an emerging advanced oxidation process with promising prospects in water treatment. Previous studies developed kinetic models of UV/NH2Cl for simulating radical concentrations and pollutant degradation. However, the reaction rate constants of Cl2•- with bicarbonate and carbonate (kCl2•-, HCO3- and kCl2•-, CO32-) were overestimated in literature. Consequently, when dosing 1 mM chloride and 1 mM bicarbonate, the current models of UV/NH2Cl severely under-predicted the experimental concentrations of three important radicals (i.e., hydroxyl radical (HO•), chlorine radical (Cl•), and dichloride radical (Cl2•-)) with great deviations (> 90 %). To investigate this issue, the transformation reactions among these three radicals in UV/NH2Cl were systematically studied. For the first time, it was found that in addition to Cl•, Cl2•- was also an important parent radical of HO• in the presence of chloride, and chloride could effectively compensate the inhibitory effect of bicarbonate on HO• generation in the system. Moreover, reactions and rate constants in current models were scrutinized from corresponding literature, and the reaction rate constants of Cl2•- with bicarbonate and carbonate (kCl2•-, HCO3- and kCl2•-, CO32-) were reevaluated to be 1.47 × 105 and 3.78 × 106 M-1s-1, respectively, by laser flash photolysis. With the newly obtained rate constants, the refined model could accurately simulate concentrations of all three radicals under different chloride and bicarbonate dosages with satisfactory deviations (< 30 %). Meanwhile, the refined model performed much better in predicting pollutant degradation and radical contribution compared with the unrefined model (with the previously estimated kCl2•-, HCO3- and kCl2•-, CO32-). The results of this study enhanced the accuracy and applicability of the kinetic model of UV/NH2Cl, and deepened the understanding of radical transformation in the process.

environmental sciences,engineering, environmental,water resources
Mechanistic study on chlorine/nitrogen transformation and disinfection by-product generation in a UV-activated mixed chlorine/chloramines system

Zhi Liu,Bin Xu,Yi-Li Lin,Tian-Yang Zhang,Tao Ye,Chen-Yan Hu,Yong-Shan Lu,Tong-Cheng Cao,Yu-Lin Tang,Nai-Yun Gao

DOI: https://doi.org/10.1016/j.watres.2020.116116

IF: 12.8

2020-10-01

Water Research

Abstract:The conversion mechanisms of chlorine species (including free chlorine, monochloramine (NH2Cl), dichloramine, and total chlorine), nitrogen species (including ammonium (NH4+), nitrate (NO3−), and nitrite (NO2−)) as well as the formation of disinfection by-products (DBPs) in a UV-activated mixed chlorine/chloramines system in water were investigated in this work. The consumption rates of free chlorine and NH2Cl were significantly promoted in a HOCl/NH2Cl coexisting system, especially in the presence of UV irradiation. Moreover, the transformation forms of nitrogen in both ultrapure and HA-containing waters were considerably affected by UV irradiation and the mass ratio of free chlorine to NH2Cl. NO3− and NO2− can be easily produced under UV irradiation, and the removal efficiency of total nitrogen with UV was obvious higher than that without UV when the initial ratio of HOCl/NH2Cl was less than 1. The roles of different radicals in the degradation of free chlorine, NH2Cl and NH4+ were also considered in such a UV-activated mixed chlorine/chloramines system. The results indicated that OH• was important to the consumption of free chlorine and NH2Cl, and showed negligible influence on the consumption of NH4+. Besides, the changes of DOC and UV254 in HA-containing water in UV-activated mixed chlorine/chloramines system indicated that the removal efficiency of DOC (24%) was much lower than that of UV254 (94%). The formation of DBPs in a mixed chlorine/chloramines system was also evaluated. The yields of DBPs decreased significantly as the mass ratio of HOCl/NH2Cl varied from 1 : 0 to 0 : 1. Moreover, compared to the conditions without UV irradiation, higher DBPs yields and DBP-associated calculated toxicity were observed during the UV-activated mixed chlorine/chloramine process.

environmental sciences,engineering, environmental,water resources
Degradation Of Aqueous Polycyclic Musk Tonalide By Ultraviolet-Activated Free Chlorine

Lili Wang,Xiaowei Liu

DOI: https://doi.org/10.3390/pr7020095

IF: 3.5

2019-01-01

Processes

Abstract:Chlorine-incorporating ultraviolet (UV) provides a multiple barrier for drinking water disinfection. Meanwhile, post-UV employment can promote the degradation of micropollutants by radical production from chlorine residual photolysis. This work studied the degradation of one such chemical, tonalide (AHTN), by low-pressure UV-activated free chlorine (FC) under typical UV disinfection dosage of < 200 mJ.cm(-2) and water matrix of filtered tank effluent. AHTN was rapidly degraded by UV/FC in accordance with pseudo-first-order kinetics. The reaction rate constants of AHTN with reactive chlorine species and hydroxyl radical (HO center dot) were estimated. Mechanistic exploration evidenced that under UV/FC, AHTN degradation was attributable to direct photolysis, ClO center dot, and HO center dot. The carbonyl side chain of AHTN served as an important attack site for radicals. Water matrices, such as natural organic matter (NOM), HCO3-, Cu2+, PO43-, and Fe2+, showed noticeable influence on the UV/FC process with an order of NOM > HCO3- > Cu2+ > PO43- > Fe2+. Reaction product analysis showed ignorable formation of chlorinated intermediates and disinfection byproducts.
Chlorination of Oxybenzone: Kinetics, Transformation, Disinfection Byproducts Formation, and Genotoxicity Changes.

Shujuan Zhang,Xiaomao Wang,Hongwei Yang,Yuefeng F. Xie

DOI: https://doi.org/10.1016/j.chemosphere.2016.03.116

IF: 8.8

2016-01-01

Chemosphere

Abstract:UV filters are a kind of emerging contaminant, and their transformation behavior in water treatment processes has aroused great concern. In particular, toxic products might be produced during reaction with disinfectants during the disinfection process. As one of the most widely used UV filters, oxybenzone has received significant attention, because its transformation and toxicity changes during chlorine oxidation are a concern. In our study, the reaction between oxybenzone and chlorine followed pseudo-first-order and second-order kinetics. Three transformation products were detected by LC-MS/MS, and the stability of products followed the order of tri-chloro-methoxyphenoyl > di-chlorinated oxybenzone > mono-chlorinated oxybenzone. Disinfection byproducts (DBPs) including chloroform, trichloroacetic acid, dichloroacetic acid and chloral hydrate were quickly formed, and increased at a slower rate until their concentrations remained constant. The maximum DBP/oxybenzone molar yields for the four compounds were 12.02%, 6.28%, 0.90% and 0.23%, respectively. SOS/umu genotoxicity test indicated that genotoxicity was highly elevated after chlorination, and genotoxicity showed a significantly positive correlation with the response of tri-chloro-methoxyphenoyl. Our results indicated that more genotoxic transformation products were produced in spite of the elimination of oxybenzone, posing potential threats to drinking water safety. This study shed light on the formation of DBPs and toxicity changes during the chlorination process of oxybenzone.
Transformation of Humic Acid and Halogenated Byproduct Formation in UV-chlorine Processes

Tong Li,Yan Jiang,Xiaoqiang An,Huijuan Liu,Chun Hu,Jiuhui Qu

DOI: https://doi.org/10.1016/j.watres.2016.06.051

IF: 12.8

2016-01-01

Water Research

Abstract:The synergistic effect of ultraviolet light (UV) and chlorine on the structural transformation of Humic Acid (HA) and formation of chloro-disinfection byproducts (DBPs) in water were investigated, with chlorination as a reference. The transformation and mineralization of HA were enhanced upon co-exposure to UV and chlorine. Electron spin resonance (ESR) studies revealed that hydroxyl radical (OH) and chlorine radical (Cl) were predominant active species in a pH range from 4 to 7, while Cl dominated at pH 2 and pH higher than 7. The impact of different radicals on the transformation of HA was investigated by UV254, fluorescence and TOC measurements. OH were found to be responsible for the removal of chromophoric groups and mineralization of HA, while Cl mainly reacted with HA and intermediates from HA degradation. Due to the competitive and synergistic reaction of OH and Cl with HA, higher removal of HA and lower formation of chloro-DBPs appeared in UV-chlorine than chlorination, thus the combined UV-chlorine processes should be a promising method for water purification.
State of the Art of UV/Chlorine Advanced Oxidation Processes: Their Mechanism, Byproducts Formation, Process Variation, and Applications

Naoyuki Kishimoto

DOI: https://doi.org/10.2965/jwet.19-021

2019-01-01

Journal of Water and Environment Technology

Abstract:The photolysis of chlorine by ultraviolet radiation (UV/chlorine) produces HO˙ and Cl˙, part of which further transforms into reactive chlorine species (RCS) like Cl2˙− and ClO˙. These radicals are responsible for the advanced oxidation effect of UV/chlorine processes. Recently, UV/chlorine processes gather much attention from researchers and practitioners and published papers on UV/chlorine processes have drastically increased, which were thoroughly reviewed in this paper for understanding the state of the art of these technologies. Fundamental studies elucidate that acidic conditions are favorable to UV/chlorine processes through a change in quantum yield of chlorine photolysis, equilibrium shifts of radical species, and a change in radical scavenger effect of free chlorine. Comparative studies reveal that UV/chlorine processes are usually more energy-efficient than UV/hydrogen peroxide and UV/persulfate processes. Although unfavorable byproducts formation by RCS reactions is apprehended, application researches in real waters show that UV/chlorine processes do not enhance disinfection byproducts formation very much. Since UV irradiation and chlorination are widely used unit operations, a barrier to install an UV/chlorine process into a conventional process is not high. It is desired to develop and optimize a whole process combined with other unit processes for maximizing benefits in water treatment in the future.
Accelerated degradation of micro-pollutant by combined UV and chlorine dioxide: Unexpected inhibition of chlorite formation

Yan Wang,Wenyu Sun,Huiyu Dong,Zhimin Qiang

DOI: https://doi.org/10.1016/j.envpol.2023.122600

2023-11-15

Abstract:UV/chlorine dioxide (ClO2) process can be intentionally or accidently conducted and is potentially effective in micro-pollutants degradation. UV irradiation can promote ClO2 decay and subsequently result in the formation of reactive radicals. Hence, the co-exposure of ClO2 and UV exhibited a synergetic effect on metribuzin (MET) degradation. The MET degradation was promoted by UV/ClO2 with a rate of 0.089 min-1 at pH 7.5, which was around 2.4 folds the total of rates caused by single ClO2 (0.004 min-1) and single UV (0.033 min-1). Reactive radicals mainly HO• and reactive chlorine species were involved in the acceleration effect, and contributed to 59%-67% of the total degradation rate of MET during UV/ClO2 under pHs 5.5-7.5. Among them, HO• was the predominant contributor and the contribution rate gradually rose under higher pH. Chlorite (ClO2-) and chlorate (ClO3-) formation has been the major concern of ClO2 oxidation. However, a comparison of their formation during UV/ClO2 and ClO2 oxidation is rarely reported. Herein, during MET degradation by ClO2, only ClO2- was identified with the highest amount of 1.17 mg L-1. Conversely, during MET degradation by UV/ClO2, only ClO3- was identified with the highest amount of 0.68 mg L-1, showing an upward trend with prolonging treatment time. Furthermore, organic halogenated DBPs formation after 24 h post-chlorination with UV/ClO2 and ClO2 pre-treatments was comparatively evaluated. Organic DBPs formation after post-chlorination was higher with UV/ClO2 pre-treatment compared to ClO2 pre-treatment. The overall concentration of DBPs produced with 30 min UV/ClO2 pre-treatment was about 4.5 times that with 1min UV/ClO2 pre-treatment. This study provided useful reference for the application of UV/ClO2 in micro-pollutants degradation.
ClO2 pre-oxidation changes dissolved organic matter at the molecular level and reduces chloro-organic byproducts and toxicity of water treated by the UV/chlorine process

Tao Li,Chii Shang,Yingying Xiang,Ran Yin,Yang Pan,Mengge Fan,Xin Yang

DOI: https://doi.org/10.1016/j.watres.2022.118341

IF: 12.8

2022-06-01

Water Research

Abstract:The formation of undesired chloro-organic byproducts is of great concern in the UV/chlorine process. In this study, chlorine dioxide (ClO2) pre-oxidation was applied to control the formation of chloro-organic byproducts and the toxicity in UV/chlorine-treated water. The molecular-level changes in dissolved organic matter (DOM) were tracked by using Fourier transform ion cyclotron resonance mass spectrometry (FT-ICR-MS) and ClO2 pre-oxidation was found to preferentially react with DOM moieties with high aromaticity level and with a carbon number of > 18, producing compounds with a higher degree of oxidation and lower aromaticity. The ClO2-treated DOM was found to be less susceptible to attack by radicals and free chlorine in the UV/chlorine process compared to the raw DOM. ClO2 pre-oxidation resulted in a significant decrease in the number of unknown chloro-organic byproducts (i.e., –17%) and the total intensity of organic chlorine detected by FT-ICR-MS (i.e., –31%). The molecular characteristics, such as O/C, aromaticity index, and the averaged number of chlorine atoms, of these unknown chloro-organic byproducts generated in the scenarios with and without ClO2 pre-oxidation were also different. Additionally, ClO2 pre-oxidation reduced the genotoxicity (SOS/umu test) and cytotoxicity (Hep G2 cytotoxicity assay) of UV/chlorine-treated water by 26% and 20%, respectively. The findings in this study highlight the merits of ClO2 pre-oxidation for controlling chloro-organic byproducts and reducing the toxicity of water treated by the UV/chlorine process in actual practice.

environmental sciences,engineering, environmental,water resources
Sources of radiant energy for medical uses; investigative needs.

F. Urbach

IF: 7.59

Journal of Investigative Dermatology

Abstract:
UV/Chlorine Process: An Efficient Advanced Oxidation Process with Multiple Radicals and Functions in Water Treatment

Kaiheng Guo,Zihao Wu,Chunyan Chen,Jingyun Fang

DOI: https://doi.org/10.1021/acs.accounts.1c00269

IF: 24.466

2022-01-13

Accounts of Chemical Research

Abstract:Because of the deterioration of global water quality, the occurrence of chemical and microbial contaminants in water raises serious concerns for the health of the population. Identifying and developing effective and environmentally friendly water treatment technologies are critical to obtain clean water. Among the various technologies for the purification of water, ultraviolet photolysis of chlorine (UV/chlorine), an emerging advanced oxidation process (AOP), has multiple functions for the control of contaminants via the production of hydroxyl radicals (HO·) and reactive chlorine species (RCS), such as Cl·, ClO·, and Cl2·-.This Account centers around the radical chemistry of RCS and HO· in different water matrices and their roles and mechanisms in the abatement of contaminants. The concentrations of Cl·, ClO·, and Cl2·- are comparable to or higher than those of HO· (10-14 to 10-13 M). The reactivities of RCS are more selective than HO· with a broader range of second-order rate constants (k). The k values of Cl· toward most aromatics are higher or similar as compared to those of HO·, while those of Cl2·- and ClO· are less reactive but more selective toward aromatics containing electron-donating functional groups. Their major reaction mechanisms with Cl· are electron transfer and addition, while those with ClO· and Cl2·- primarily involve electron transfer. As for aliphatics, their reactivities with both HO· and RCS are much lower than those of aromatics. The reaction mechanisms for most of them with Cl· and Cl2·- are hydrogen abstraction, except for olefins, which are addition. In addition, RCS greatly contribute to the inactivation of microbial contaminants.Toward future application, the UV/chlorine process has both pros and cons. Compared with the traditional HO·-based AOP of UV/H2O2, UV/chlorine is more efficient and energy-saving for oxidation and disinfection, and its efficiency is less affected by water matrix components. However, the formation of toxic byproducts in UV/chlorine limits its application scenarios. In dissolved organic matter (DOM)-rich water, the formation of halogenated byproducts is enhanced in UV/chlorine. In the presence of ammonia, reactive nitrogen species (RNS) (e.g., ·NO and ·NO2) are involved, and highly toxic nitro(so) products such as nitro(so)-phenolics and N-nitrosodimethylamine are generated. For a niche application, the UV/chlorine process is recommended to be utilized in water with low levels of DOM and ammonia.Strategies should be developed to make full use of highly reactive species (RCS and HO·) for the abatement of target contaminants and to reduce the formation of toxic byproducts. For example, the UV/chlorine process can be used in tandem with other treatments to create multiple barriers for the production of safe water. In addition, halogen radicals are very important in ecosystems as well as other areas such as medical therapy and organic synthesis. UV/chlorine is the most efficient homogeneous system to generate halogen radicals, and thus it provides a perfect system to investigate the fates of halogen radicals for interdisciplinary research.

chemistry, multidisciplinary
Chlorine Oxide Radical (clo) Enables the Enhanced Degradation of Antibiotic Resistance Genes During UV/chlorine Treatment by Selectively Inducing Base Damage.

Mu-Cen Yao,Xin Zhang,Qi Huang,Jie Huang,Guo-Ping Sheng

DOI: https://doi.org/10.1016/j.envint.2023.108121

IF: 11.8

2023-01-01

Environment International

Abstract:Compared to individual UV or chlorine disinfection, the combined UV and chlorine (i.e., UV/chlorine) can substantially promote the degradation of antibiotic resistance genes (ARGs) in the effluent by generating radicals. However, the mechanisms of ARG degradation induced by radicals during UV/chlorine treatment remain largely unknown, limiting further enhancement of ARG degradation by process optimization. Herein, we aimed to uncover the role of different radicals in ARG degradation and the molecular mechanisms of ARG degradation by radicals in UV/chlorine process. The ClO (center dot) was proven to be responsible for the enhanced ARG degradation during UV/chlorine treatment, while the other radicals ((OH)-O-center dot, Cl, and Cl-2 (-)) played a minor role. This is because ClO center dot possessed both high steady-state concentration and high reactivity toward ARGs (rate constant: 4.29 x 10(10) M (-1) s (-1)). The ClO might collaborate with free chlorine to degrade ARG. The ClO (center dot) degraded ARGs by selectively attacking guanine and thymine but failed to induce strand breakage, while chlorine could break the strand of ARGs. Ultimately, ClO (center dot) cooperated with chlorine to degrade ARGs quickly by hydroxylation and chlorination of bases and produce many chlorine- and nitrogen-containing products as revealed by high-resolution mass spectrometry. The uncovered degradation mechanisms of ARGs by UV/chlorine provide useful guidelines for process optimization to achieve deep removal of effluent ARGs.
Revealing the Generation of High-Valent Cobalt Species and Chlorine Dioxide in the Co3O4-Activated Chlorite Process: Insight into the Proton Enhancement Effect

Ruidian Su,Nan Li,Zhen Liu,Xiaoyang Song,Wen Liu,Baoyu Gao,Weizhi Zhou,Qinyan Yue,Qian Li

DOI: https://doi.org/10.1021/acs.est.2c04903

IF: 11.4

2023-01-01

Environmental Science & Technology

Abstract:A Co3O4-activated chlorite (Co3O4/chlorite) process was developed to enable the simultaneous generation of high-valent cobalt species [Co(IV)] and ClO2 for efficient oxidation of organic contaminants. The formation of Co(IV) in the Co3O4/chlorite process was demonstrated through phenylmethyl sulfoxide (PMSO) probe and 18O-isotope-labeling tests. Both experiments and theoretical calculations revealed that chlorite activation involved oxygen atom transfer (OAT) during Co(IV) formation and proton-coupled electron transfer (PCET) in the Co(IV)-mediated ClO2 generation. Protons not only promoted the generation of Co(IV) and ClO2 by lowering the energy barrier but also strengthened the resistance of the Co3O4/chlorite process to coexisting anions, which we termed a proton enhancement effect. Although both Co(IV) and ClO2 exhibited direct oxidation of contaminants, their contributions varied with pH changes. When pH increased from 3 to 5, the deprotonation of contaminants facilitated the electrophilic attack of ClO2, while as pH increased from 5 to 8, Co(IV) gradually became the main contributor to contaminant degradation owing to its higher stability than ClO2. Moreover, ClO2- was transformed into nontoxic Cl- rather than ClO3- after the reaction, thus greatly reducing possible environmental risks. This work described a Co(IV)-involved chlorite activation process for efficient removal of organic contaminants, and a proton enhancement mechanism was revealed.
Photolysis of free chlorine and production of reactive radicals in the UV/chlorine system using polychromatic spectrum LEDs as UV sources

Guo-Qiang Li,Zheng-Yang Huo,Qian-Yuan Wu,Zhuo Chen,Yin-Hu Wu,Yun Lu,Hong-Ying Hu

DOI: https://doi.org/10.1016/j.chemosphere.2021.131828

IF: 8.8

2022-01-01

Chemosphere

Abstract:Recently, ultraviolet light-emitting diodes (UV-LEDs) and chlorine combined system has been employed as an emerging advanced oxidation process. However, UV-LEDs were commonly considered as monochromatic UV sources. In this study, the obvious quantum yields of chlorine photolysis under 265 nm and 280 nm LEDs irradiations were investigated with treating LEDs as polychromatic UV sources. Particularly, Φobs-poly of HOCl and OCl⁻ for 265 nm LED were found to be 1.50 and 0.70 mol E−1, respectively, whereas Φobs-poly of HOCl and OCl⁻ for 280 nm LED were 1.28 and 0.64 mol E−1, respectively. It was identified that Φobs-poly were 5.66–14.63 % lower than Φobs-mono. This suggests that obvious quantum yield using peak emission wavelength would overestimate the true quantum yield. The production of radical species in LED UV/chlorine systems were determined by the degradation of BA, and illustrated by a mathematical model. Different trends were observed for 265 nm and 280 nm LED UV/chlorine systems as pH increased from 5.0 to 10.0. As pH increased, the formation of OH continuously decreased in both 265 nm and 280 nm LED systems. The formation of Cl increased at neutral pH and more Cl and OH were formed due to the higher molar absorbance coefficient at 280 nm. The chlorine dose-dependent effects on radical productions at pH of 5.0, 7.5 and 10.0 were also assessed. At pH of 5.0, OH was the main radical product and had linear correlation with chlorine dose. At pH of 7.5, the productions of OH and Cl showed similar profiles that increased rapidly at low chlorine dosage and then slowed down.

Iron-binding characteristics of neuromelanin of the human substantia nigra.

Impact of UV Irradiation on Chlorella Sp. Damage and Disinfection Byproducts Formation During Subsequent Chlorination of Algal Organic Matter

The multiple roles of chlorite on the concentrations of radicals and ozone and formation of chlorate during UV photolysis of free chlorine

Insights into the wavelength-dependent photolysis of chlorite: Elimination of carbamazepine and formation of chlorate

Photolysis of Chlorine Dioxide under UVA Irradiation: Radical Formation, Application in Treating Micropollutants, Formation of Disinfection Byproducts, and Toxicity under Scenarios Relevant to Potable Reuse and Drinking Water

Micropollutant Abatement and Byproduct Formation During the Co-Exposure of Chlorine Dioxide (clo2) and UVC Radiation.

Photochemical Transformation of Free Chlorine Induced by Triplet State Dissolved Organic Matter

Performance evaluation of the UV activated chlorite process on trimethoprim: Degradation efficiency, energy consumption and disinfection by-products formation

Refinement of kinetic model and understanding the role of dichloride radical (Cl2•−) in radical transformation in the UV/NH2Cl process

Mechanistic study on chlorine/nitrogen transformation and disinfection by-product generation in a UV-activated mixed chlorine/chloramines system

Degradation Of Aqueous Polycyclic Musk Tonalide By Ultraviolet-Activated Free Chlorine

Chlorination of Oxybenzone: Kinetics, Transformation, Disinfection Byproducts Formation, and Genotoxicity Changes.

Transformation of Humic Acid and Halogenated Byproduct Formation in UV-chlorine Processes

State of the Art of UV/Chlorine Advanced Oxidation Processes: Their Mechanism, Byproducts Formation, Process Variation, and Applications

Accelerated degradation of micro-pollutant by combined UV and chlorine dioxide: Unexpected inhibition of chlorite formation

ClO2 pre-oxidation changes dissolved organic matter at the molecular level and reduces chloro-organic byproducts and toxicity of water treated by the UV/chlorine process

Sources of radiant energy for medical uses; investigative needs.

UV/Chlorine Process: An Efficient Advanced Oxidation Process with Multiple Radicals and Functions in Water Treatment

Chlorine Oxide Radical (clo) Enables the Enhanced Degradation of Antibiotic Resistance Genes During UV/chlorine Treatment by Selectively Inducing Base Damage.

Revealing the Generation of High-Valent Cobalt Species and Chlorine Dioxide in the Co3O4-Activated Chlorite Process: Insight into the Proton Enhancement Effect

Photolysis of free chlorine and production of reactive radicals in the UV/chlorine system using polychromatic spectrum LEDs as UV sources