Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks
Min Tu,Benzheng Xia,Dmitry E. Kravchenko,Max Lutz Tietze,Alexander John Cruz,Ivo Stassen,Tom Hauffman,Joan Teyssandier,Steven De Feyter,Zheng Wang,Roland A. Fischer,Benedetta Marmiroli,Heinz Amenitsch,Ana Torvisco,Miriam de J. Velásquez-Hernández,Paolo Falcaro,Rob Ameloot
DOI: https://doi.org/10.1038/s41563-020-00827-x
IF: 41.2
2020-10-26
Nature Materials
Abstract:Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state devices. Conventional MOF patterning methods suffer from low resolution and poorly defined pattern edges. Here, we demonstrate the resist-free, direct X-ray and electron-beam lithography of MOFs. This process avoids etching damage and contamination and leaves the porosity and crystallinity of the patterned MOFs intact. The resulting high-quality patterns have excellent sub-50-nm resolution, and approach the mesopore regime. The compatibility of X-ray and electron-beam lithography with existing micro- and nanofabrication processes will facilitate the integration of MOFs in miniaturized devices.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter