Abstract:High-power impulse magnetron sputtering (HiPIMS), a new physical vapor deposition technique which combines the advantages of the high ionization rates of the sputtered materials and control of electromagnetism, has been widely used to deposit high-performance coatings with a large density and high adhesion. However, HiPIMS has some intrinsic disadvantages such as the low deposition rate, unstable discharge, and different ionization rates for different materials thereby hampering wider industrial adoption. We have recently designed an optimized cylindrical source based on the hollow cathode effect to circumvent the aforementioned limitations. However, during the operation of the cylindrical source, the discharge is inhomogeneous and the etching stripes are nonuniform. In order to determine the underlying mechanism and optimize the electromagnetic control, the discharge in the HiPIMS cylindrical source is simulated. The tangential magnetic field distribution on the target surface of the cylindrical sputtering source is inhomogeneous and electron runaway is serious, resulting in a relatively low plasma density. Two solutions are proposed to improve the situations. The first one is electrical improvement by installing an electron blocking plate, and the second one is magnetic improvement by adding compensating magnets. Our simulation results of the first method show that a potential well is produced by the electron blocking plate to suppress electron runaway and the plasma density is improved significantly, especially around the central cross-section of the cylindrical sputtering source. The discharge becomes homogeneous, and the etching stripes are uniform albeit not full enough. The second method of magnetic improvement significantly improves the homogeneity of the tangential magnetic field distribution on the target surface and the target utilization rate. After adding the optimized compensating magnets, the shape of the effective area (the value of the tangential magnetic field in a range of 25-50 mT) on the target surface can be controlled and made zonal. The target utilization rate increases to over 80% from 60%. In order to obtain the optimal conditions, the two techniques are combined. A larger and more homogeneous etching ring is observed by adopting both the electrical and magnetic improvements as predicted and explained by the simulation results. It can be concluded that the combination of the two improvement techniques can improve and optimize the HiPIMS cylindrical source.

Development of pulsed magnetic field assisted supersonic plasma spraying

Stable Single Device Multi-Pore Electrospraying of Polymeric Microparticles Via Controlled Electrostatic Interactions

Effect of Magnetic Field Type on the Flight State of Supersonic Plasma Spray Particles and Coating Properties

Effect of a pulsed magnetic field on the tribological properties of amorphous/nanocrystalline composite coatings by supersonic plasma spraying

Modeling of Micro- and Nanoparticle Characteristics in DC Suspension Plasma Spray

Modeling of non-Newtonian suspension plasma spraying in an inductively coupled plasma torch

Study on Preparation and Wear Resistance of Nicrbsi-Wc/Co Composite Coatings by Pulsed Magnetic Field Assisted Supersonic Plasma Spraying

Dynamic Modeling of Micro- and Nano-Sized Particles Impinging on the Substrate During Suspension Plasma Spraying

Enhanced Discharge of High P Ower Pulsed Magnetron Sputtering Coupling with High Voltage

The Analysis of Melting and Refining Process for In-Flight Particles in Supersonic Plasma Spraying

Effects of Atomization Injection on Nanoparticle Processing in Suspension Plasma Spray

Nanoparticles Modeling in Axially Injection Suspension Plasma Spray of Zirconia and Alumina Ceramics

Application of Near-Infrared Spectroscopy Combined with Design of Experiments for Process Development of the Pulsed Spray Fluid Bed Granulation Process

Integrated study on the comprehensive magnetic-field configuration performance in the 150 kW superconducting magnetoplasmadynamic thruster

Magnetic field enhanced discharge and water activation of atmospheric pressure plasma jet: effect of assistance region and underlying physico-chemical mechanism

Effect of Steady Magnetic Field on Microstructure and Properties of NiCrBSi Coating by Supersonic Plasma Spraying

Flow Characteristic of In-Flight Particles in Supersonic Plasma Spraying Process

Effect of Process Parameters on Yttria‐Stabilized Zirconia Particles In‐Flight Behavior and Melting State in Atmospheric Plasma Spraying

Electromagnetic Control and Optimization of High Power Impulse Magnetron Sputtering Discharges in Cylindrical Source

Novel Plasma Immersion Ion Implantation and Deposition Hardware and Technique Based on High Power Pulsed Magnetron Discharge

Numerical Study of Particle In-Flight Characteristics in a RF Induction Plasma Spray