Investigation of defect formation and electronic transport in microcrystalline silicon deposited by hot-wire CVD

M. Stöger,A. Breymesser,V. Schlosser,M. Ramadori,V. Plunger,D. Peiró,C. Voz,J. Bertomeu,M. Nelhiebel,P. Schattschneider,J. Andreu
DOI: https://doi.org/10.1016/S0921-4526(99)00568-2
1999-12-15
Abstract:
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