Improved-Performance Diamond Schottky Barrier Diode With Tin Oxide Interlayer

Shumiao Zhang,Juan Wang,Qi Li,Guoqing Shao,Genqiang Chen,Shi He,Ruozheng Wang,Wei Wang,Renan Bu,Feng Wen,Hong-Xing Wang
DOI: https://doi.org/10.1109/ted.2022.3209165
IF: 3.1
2022-10-26
IEEE Transactions on Electron Devices
Abstract:A SnO2 thin layer was deposited between the diamond and Schottky electrode to fabricate the metal–insulator–semiconductor Schottky barrier diode (MIS-SBD). The current–voltage and current–voltage–temperature characteristics in the range from 25 °C to 150 °C of diamond SBD were investigated. The Schottky barrier height of MIS-SBD is 1.84 eV. Compared with metal–semiconductor (MS) SBD, the diamond MIS-SBD shows more stable values of barrier height and ideality factor as temperature increased. The difference in interface states density between MIS-SBD and MS-SBD is almost 2 orders of magnitude, and the breakdown voltage was increased from 102 to 123 V after introducing SnO2 layer. These results indicate that the MIS-SBD with SnO2 insulating layer shows a better performance.
engineering, electrical & electronic,physics, applied
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