In-site synthesis molecular imprinting Nb2O5 -based photoelectrochemical sensor for bisphenol A detection

Pan Gao,Hai Wang,Pengwei Li,Wenkai Gao,Yu Zhang,Junli Chen,Nengqin Jia
DOI: https://doi.org/10.1016/j.bios.2018.08.070
2018-12-15
Abstract:In this work, a photoelectrochemical (PEC) sensor based on inorganic surface molecular imprinting Nb2O5 (MI-Nb2O5) for detection of bisphenol A (BPA) had been developed. In the PEC sensor, MI-Nb2O5 material was synthesized based on an in-situ surface molecular imprinting technique. The microstructure characteristics of the as-prepared photoactive materials were systematically investigated by XRD, SEM, TEM, XPS, FTIR and UV-vis spectroscopy. The PEC detection results showed that the MI-Nb2O5 material had higher photocurrent responses and excellent selectivity for contaminant BPA under UV-light irradiation owing to the abundant special recognition sites on the surface of MI-Nb2O5. Besides, the PEC sensor exhibited a wide detection range from 0.01 nmol·L-1 to 30 nmol·L-1 with a low limit of detection (LOD) of 0.004 nmol·L-1. The interferences test showed that the sensor had a good selectivity to BPA molecules in the different interference solutions. This method combining molecular imprinting technique with photoelectrochemical detection measurement made a successful attempt to detect BPA and supplied a promising way to detect other environment pollutions rapidly and selectively in the future.
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