A Theoretical Analysis on the Oxidation and Water Dissociation Resistance on Group‐IV Phosphide Monolayers

Jie Wu,Jia‐Hui Li,Yang‐Xin Yu
DOI: https://doi.org/10.1002/cphc.202000766
IF: 3.52
2020-11-03
ChemPhysChem
Abstract:Group‐IV phosphide monolayers provide a versatile platform for photocatalysts, optoelectronic and nanoelectronic devices. Here, comprehensive first‐principles calculations and ab initio molecular dynamics (AIMD) simulations were performed to explore their stabilities in the air. We identified that the MP monolayers have excellent mechanical properties and their carrier mobility are higher than that of phosphorene. The MP monolayers were predicted to be able to possess superior oxidation resistance than the BP monolayer based on the proposed donation‐backdonation theory. It was observed that the dissociation and chemisorption of a water molecule on the monolayers are kinetically difficult both in the water and oxygen‐water environments involving energy barriers of 1.28‐3.48 eV. We also performed AIMD simulations at 300, 1000, 1200 and 1500 K. It is noteworthy that only the CP monolayer can retain intact structure at 1500 K, while the other three monolayers can just sustain to 1200 K. These results provide a guidance for their practical application and experimental fabrication.
chemistry, physical,physics, atomic, molecular & chemical
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