Design and Research of Novel Consequent-Pole Dual PM Vernier Machines with Spoke and Halbach Array

Yaokun Li,Libing Jing

DOI: https://doi.org/10.1007/s42835-024-01788-w

2024-02-12

Abstract:The conventional dual permanent magnet vernier machine (DPMVM) has simple structure and high torque density, but the consequent-pole (CP) structure will produce magnetic flux leakage (MFL), which limits the further improvement of torque. Based on the topology of the conventional DPMVM, this paper proposes two DPMVMs with different PM arrangements, which aims to further improve the torque density, reduce MFL problem of the conventional DPMVM, and improve the power factor. Firstly, the sensitivity analysis of machine parameters is carried out. Then, according to the analysis results, the optimal parameter solution is obtained by single parameter scanning, response surface analysis and multi-objective genetic algorithm optimization. Finally, the optimized two-dimensional finite element model is established, and the electromagnetic performance of the proposed machines and the conventional DPMVM is compared. The results show that the output performance of the proposed machines is obviously better than that of the conventional DPMVM.

engineering, electrical & electronic