Photoluminescence patterns via single-layer exfoliation in Gr/MoS 2 heterostructure using contact-mode atomic force microscopy

Chak-Ming Liu,Wen-Hsiang Chang,En-De Chu,Chun-Han Yin,Yann-Wen Lan,Hsiang-Chih Chiu,Wen-Chin Lin
DOI: https://doi.org/10.2139/ssrn.4570325
IF: 6.7
2023-10-31
Applied Surface Science
Abstract:The stacking of two-dimensional (2D) materials presents numerous opportunities for various nanodevice applications. Achieving atomic-thick precision in microscopic patterning is crucial to manipulating the functionalities and interfacial interactions of the 2D heterostructures. In this study, a silicon atomic force microscopy (AFM) tip was utilized to rub the surface of graphene (Gr)/MoS 2 heterostructure and manipulate its physical properties. The contact force between the AFM tip and Gr/MoS 2 surface was adjusted between 110 and 660 nN. Before rubbing, the photoluminescence (PL) intensity of MoS 2 was quenched due to the presence of Gr. After rubbing, the optical image and Raman spectroscopy acquired from the Gr/MoS 2 heterostructure indicated that Gr started to be exfoliated by a contact force exceeding 220 nN. The absence of Gr due to exfoliation led to the restoration of MoS 2 ′s pristine PL intensity. For demonstration, the AFM tip was used to exfoliate a designed micro-area covered with Gr using a 660 nN force, forming a patterned PL of MoS 2 . This technique enabled the creation of different structures to develop unique multilayer 2D material devices.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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