Overcoming the limitations of atomic-scale simulations on semiconductor catalysis with changing Fermi level and surface treatment

Seulgi Ji,Dong Won Jeon,Junghyun Choi,Haneol Cho,Bo-In Park,Ilpyo Roh,Hyungil Choi,Chansoo Kim,Jung Kyu Kim,Uk Sim,Danlei Li,Hyunseok Ko,Sung Beom Cho,Heechae Choi
DOI: https://doi.org/10.1039/d4ta03595j
IF: 11.9
2024-01-01
Journal of Materials Chemistry A
Abstract:A new groundbreaking method for efficient optimization of doping concentration and cocatalyst materials for Fermi level engineering of wide band gap semiconductors.
materials science, multidisciplinary,chemistry, physical,energy & fuels
What problem does this paper attempt to address?