Precise Patterning of Silk Microstructures Using Photolithography

Nicholas E. Kurland,T. Dey,S. Kundu,V. Yadavalli
DOI: https://doi.org/10.1002/adma.201302823
2013-11-01
Advances in Materials
Abstract:Photolithography is used in conjunction with a "silk fibroin photoresist" to form precise protein microstructures directly and rapidly on a variety of substrates. High-resolution features in two and three dimensions with line widths down to one micrometer are formed. Photo-crosslinked protein structures guide cell adhesion, providing precise spatial control of cells without requiring adhesive ligands.
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