High Pressure Apparatus for in situ X-ray Diffraction and Electrical Resistance Measurement at Low Temperature

J. Tang,Takehiko Matsumoto,N. Mōri
DOI: https://doi.org/10.4131/JSHPREVIEW.7.1496
1998-03-03
Abstract:A new high pressure apparatus with cubic anvil device has been developed to carry out simultaneously X-ray diffraction and electrical resistance measurement up to 10 GPa at low temperature down to 7 K. This apparatus consists mainly of a uniaxial press for pressure generation, an X-ray diffraction system with an energy dispersive detector, and a cryostat. Some experimental results of the simultaneous measurements obtained by using this apparatus are also reported.
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