Optimal decentralized wavelength control in light sources for lithography

Mruganka Kashyap
DOI: https://doi.org/10.48550/arXiv.2409.04721
2024-11-17
Abstract:Pulsed light sources are a critical component of modern lithography, with fine light beam wavelength control paramount for wafer etching accuracy. We study optimal wavelength control by casting it as a decentralized linear quadratic Gaussian (LQG) problem in presence of time-delays. In particular, we consider the multi-optics module (optics and actuators) used for generating the requisite wavelength in light sources as cooperatively interacting systems defined over a directed acyclic graph (DAG). We show that any measurement and other continuous time-delays can be exactly compensated, and the resulting optimal controller implementation at the individual optics-level outperforms any existing wavelength control techniques.
Systems and Control,Optimization and Control
What problem does this paper attempt to address?