Interfacial reaction boosts thermal conductance of room-temperature integrated semiconductor interfaces stable up to 1100 C

Zhe Cheng,Xiaoyang Ji,Zifeng Huang,Yutaka Ohno,Koji Inoue,Yasusyohi Nagai,Yoshiki Sakaida,Hiroki Uratani,Naoteru Shigekawa,Jianbo Liang
2024-04-14
Abstract:Overheating has emerged as a primary challenge constraining the reliability and performance of next-generation high-performance electronics, such as chiplets and (ultra)wide bandgap electronics. Advanced heterogeneous integration not only constitutes a pivotal technique for fabricating these electronics but also offers potential solutions for thermal management. This study presents the integration of high thermal conductivity semiconductors, specifically, 3C-SiC thin films and diamond substrates, through a room-temperature surface-activated bonding technique. Notably, the thermal conductivity of the 3C-SiC films is among the highest for all semiconductor films which can be integrated near room temperature with similar thicknesses. Furthermore, following annealing, the interfaces between 3C-SiC and diamond demonstrate a remarkable enhancement in thermal boundary conductance (TBC), reaching up to approximately 300%, surpassing all other grown and bonded heterointerfaces. This enhancement is attributed to interfacial reactions, specifically the transformation of amorphous silicon into SiC upon interaction with diamond, which is further corroborated by picosecond ultrasonics measurements. Subsequent to annealing at 1100 C, the achieved TBC (150 MW/m2-K) is record-high among all bonded diamond interfaces. Additionally, the visualization of large-area TBC, facilitated by femtosecond laser-based time-domain thermoreflectance measurements, shows the uniformity of the interfaces which are capable of withstanding temperatures as high as 1100 C. Our research marks a significant advancement in the realm of thermally conductive heterogeneous integration, which is promising for enhanced cooling of next-generation electronics.
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
This paper addresses the thermal management issue of high-performance electronic devices (such as chips and wide bandgap semiconductors) at high temperatures. The study integrates high thermal conductivity 3C-SiC thin films with diamond substrates through room temperature surface activation bonding technology, resulting in a significant improvement in the thermal boundary conductance (TBC) interface, up to a maximum of 300%. This helps with heat dissipation and enhances the reliability of next-generation electronic devices. The structural changes in the interface, driven by high-temperature annealing, promote chemical reactions between silicon and diamond, forming a single crystal SiC layer, thus strengthening the TBC. This research provides a new pathway for efficient thermal management through heterogeneous integration.