Abstract:Superconducting Nb thin films have recently attracted significant attention due to their utility for quantum information technologies. In the processing of Nb thin films, fluoride-based chemical etchants are commonly used to remove surface oxides that are known to affect superconducting quantum devices adversely. However, these same etchants can also introduce hydrogen to form Nb hydrides, potentially negatively impacting microwave loss performance. Here, we present comprehensive materials characterization of Nb hydrides formed in Nb thin films as a function of fluoride chemical treatments. In particular, secondary-ion mass spectrometry, X-ray scattering, and transmission electron microscopy reveal the spatial distribution and phase transformation of Nb hydrides. The rate of hydride formation is determined by the fluoride solution acidity and the etch rate of Nb2O5, which acts as a diffusion barrier for hydrogen into Nb. The resulting Nb hydrides are detrimental to Nb superconducting properties and lead to increased power-independent microwave loss in coplanar waveguide resonators. However, Nb hydrides do not correlate with two-level system loss or device aging mechanisms. Overall, this work provides insight into the formation of Nb hydrides and their role in microwave loss, thus guiding ongoing efforts to maximize coherence time in superconducting quantum devices.

What problem does this paper attempt to address?

### Problems Addressed by the Paper This paper primarily explores the impact of fluoride chemical etching on the formation of hydrides in niobium (Nb) thin films and its effect on microwave loss performance. Specifically: 1. **Mechanism of Hydride Formation**: The study investigates the mechanism of hydride formation in niobium thin films under different acidic conditions using fluoride chemical etchants (such as NH₄F, BOE, and HF). Various characterization techniques, including Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), X-ray Diffraction (XRD), and Transmission Electron Microscopy (TEM), are employed to reveal the spatial distribution and phase transformation process of hydrides in niobium thin films. 2. **Role of Niobium Oxides**: The paper examines the role of niobium surface oxides (Nb₂O₅) in the formation of hydrides. It is found that the rate at which the etchant removes niobium surface oxides is closely related to the rate at which hydrogen enters the niobium thin films. 3. **Impact on Superconducting Properties**: The study explores the impact of hydrides on the superconducting properties of niobium thin films, such as the critical temperature (Tc) and the residual resistivity ratio (RRR). It is discovered that the formation of hydrides leads to the deterioration of superconducting properties. 4. **Microwave Loss Performance**: Through tests using coplanar waveguide resonators (CPW resonators), it is found that the presence of niobium hydrides directly increases power-independent microwave loss but shows no significant correlation with two-level system (TLS) loss. In summary, this work aims to provide guidance for improving the coherence time of superconducting quantum devices by gaining a deeper understanding of the mechanism of niobium hydride formation and its impact on microwave loss.

Formation and Microwave Losses of Hydrides in Superconducting Niobium Thin Films Resulting from Fluoride Chemical Processing

Formation and Microwave Losses of Hydrides in Superconducting Niobium Thin Films Resulting from Fluoride Chemical Processing

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