Abstract:Amidst the growing importance of hydrogen in a sustainable future, it is crucial to develop coatings that can protect hydrogen-sensitive system components in reactive hydrogen environments. However, the prediction of the chemical stability of materials in hydrogen is not fully understood. In this study, we show that the work function is a key parameter determining the reducibility (i.e., de-nitridation) of transition metal nitrides (TMNs) in hydrogen radicals (H*) at elevated temperatures. We demonstrate that when the work function of a TMN system drops below a threshold limit, its reduction effectively stops. We propose that this is due to the preferential binding of H* to TM-atoms rather than N-atoms, which makes the formation of volatile species (NHx) unfavourable. This finding provides a novel perspective for comprehending the interaction of hydrogen with transition metal compounds and allows predicting the chemical stability of hydrogen-protective coatings.

What problem does this paper attempt to address?

This paper aims to explore the reduction reaction mechanism of transition metal nitrides (TMNs) in a hydrogen environment, especially how the work function of these materials affects their stability in hydrogen. Specifically, the researchers hope to understand how the work function, as a key parameter, determines the reduction behavior (i.e., the denitrification process) of TMNs in a hydrogen radical (H*) environment. Through this study, the authors propose a new perspective to understand the interaction between hydrogen and transition metal compounds and provide a method to predict the chemical stability of hydrogen - protective coatings. ### Main problems 1. **Reduction mechanism of TMNs in a hydrogen environment**: The researchers attempt to reveal how the work function affects the reduction reaction of TMNs in a hydrogen environment. They find that when the work function of the TMN system drops below a certain threshold (\(\phi_{TH}\)), its reduction reaction will effectively stop. This is because H* is more likely to combine with transition metal (TM) atoms rather than nitrogen (N) atoms, which makes the formation of volatile species (such as NHx) unfavorable. 2. **Predicting the chemical stability of materials**: Through experimental and theoretical analysis, the researchers hope to find a method to predict the chemical stability of materials in a hydrogen environment. This is crucial for developing coating materials that can protect systems in a reactive hydrogen environment. ### Experimental methods - **Sample preparation**: The researchers used reactive direct - current magnetron sputtering technology to deposit TiN, TaN, and NbN films with a thickness of 5 ± 0.5 nm on Si(100) substrates. - **Pretreatment**: The samples were vacuum - annealed at 700°C for 2 hours to saturate any thermally - induced processes. - **Hydrogen radical exposure**: The samples were exposed to hydrogen radicals (H*) at 700°C under the exposure condition of \(10^{21}\pm1\ H*m^{- 2}s^{-1}\). - **Characterization**: The chemical composition and work function changes of the samples were measured by angle - resolved X - ray photoelectron spectroscopy (AR - XPS). ### Experimental results - **TiN samples**: Mainly showed surface deoxidation, and the work function decreased from 4.9 ± 0.3 eV to 4.2 ± 0.3 eV. Further reduction reactions stopped after 2 hours. - **TaN and NbN samples**: In addition to surface deoxidation, they also showed denitrification. The work function of the TaN sample decreased to 4.3 ± 0.3 eV after 2 hours, while the work function of the NbN sample decreased to 4.4 ± 0.3 eV after 8 hours, at which point the reduction reaction stopped. ### Conclusions - **Threshold of the work function**: The study found that when the work function of TMN drops to about 4.3 ± 0.4 eV, its reduction reaction will stop. This threshold is consistent with the threshold (about 4.4 ± 0.2 eV) at which the formation energies of H+ and H− in semiconductors and insulators are equal as reported in the literature. - **Binding preference of hydrogen radicals**: When the work function is below the threshold, H* is more likely to combine with TM atoms rather than N atoms, thereby preventing the reduction of TMN. - **Prediction of material stability**: This finding provides a new perspective for predicting the chemical stability of hydrogen - protective coatings and is applicable to a wide range of transition metal compounds. Through these studies, the authors provide important theoretical and experimental bases for understanding and predicting the interaction between hydrogen and transition metal compounds, which is of great significance for developing efficient hydrogen - protective coatings.

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