Photolithography Control System : A Case Study For Cyber-Physical System

Youbao Zhang,Huijie Huang
2024-02-24
Abstract:Photolithography control system (PCS) is an extremely complex distributed control system, which is composed of dozens of networked microprocessors, hundreds of actuators, hundreds of thousands of sensors, and millions of lines of code. Cyber-physical system (CPS), which deeply merges computation with physical processes together, copes with complex system from a higher level of abstraction. PCS is a representative CPS. This work points out that thinking under the framework of CPS, which includes holistic perspective, model-based design, hardware/software co-design and continuous integration, could solve the issues presented in the current PCS. Although the traditional embedded system approach and the CPS approach would be coexisting in the PCS for a long time, the CPS approach is definitely the future of the PCS development.
Systems and Control,Hardware Architecture
What problem does this paper attempt to address?
The paper aims to explore the challenges and solutions of the Photolithography Control System (PCS) in photolithography technology. Specifically: 1. **Complex System Design**: The Photolithography Control System is an extremely complex distributed control system, comprising dozens of networked microprocessors, hundreds of actuators, hundreds of thousands of sensors, and millions of lines of code. The paper points out that by viewing PCS as a Cyber-Physical System (CPS), current PCS issues can be addressed through a holistic perspective, model-based design, hardware-software co-design, and continuous integration methods. 2. **Coexistence of Traditional and CPS Methods**: Although traditional embedded system methods and CPS methods will coexist for some time, the paper argues that CPS methods are undoubtedly the future direction for PCS development. 3. **Research Progress of CPS**: The paper first summarizes the development history and research achievements of CPS and proposes suggestions on how to develop systems and projects within the CPS framework. 4. **Migration of PCS to CPS Framework**: The paper details how to convert traditional embedded systems to the CPS framework, including specific implementation methods in aspects such as layered architecture, modular design, and configuration management. 5. **Interaction Between PCS and CPS**: The paper discusses the mutual influence and contribution between PCS and CPS, emphasizing the importance of CPS in the future development of PCS. In summary, this paper mainly discusses how to use the concepts and technologies of CPS to improve the complexity and real-time performance of the Photolithography Control System, thereby promoting the progress and development of photolithography technology.