Reliable Lift‐Off Patterning of Graphene Dispersions for Humidity Sensors
Jorge Eduardo Adatti Estévez,Fabian Hecht,Sebastian Wittmann,Simon Sawallich,Annika Weber,Caterina Travan,Franz Hopperdietzl,Ulrich Krumbein,Max Christian Lemme
DOI: https://doi.org/10.1002/admi.202301095
IF: 5.4
2024-05-11
Advanced Materials Interfaces
Abstract:A novel patterning method for graphene dispersions based on the well‐established metal lift‐off process is demonstrated and characterized. The method yields uniform graphene flake films and reproducible sheet resistances. It is used to fabricate highly uniform humidity sensors with reduced noise, resulting in a detection limit below 1% relative humidity. Dispersion‐based graphene materials are promising candidates for various sensing applications. They offer the advantage of relatively simple and fast deposition via spin‐coating, Langmuir–Blodgett deposition, or inkjet printing. Film uniformity and reproducibility remain challenging in all of these deposition methods. Here, a scalable structuring method is demonstrated, characterized, and successfully applied for graphene dispersions. The method is based on a standard lift‐off process, is simple to implement, and increases the film uniformity of graphene devices. It is also compatible with standard semiconductor manufacturing methods. Two different graphene dispersions are investigated via Raman spectroscopy and Atomic Force Microscopy and observe no degradation of the material properties by the structuring process. Furthermore, high uniformity of the structured patterns and homogeneous graphene flake distribution is achieved. Electrical characterizations show reproducible sheet resistance values correlating with material quantity and uniformity. Finally, repeatable humidity sensing is demonstrated with van der Pauw devices, with sensing limits of less than 1% relative humidity.
materials science, multidisciplinary,chemistry