Abstract:In the Editorial leading into the first issue of this year's volume 6 of Plasma Processes and Polymers, PPP (see PPP 6, 2009, pages 7 to 10), the editors mentioned, among numerous other points of interest for the journal's readership, several planned Special Issues (“SI”) comprising high-quality papers on various themes of low temperature plasma science and technology, including modeling. This current SI on Plasma Modeling and Simulation aims to identify current and new challenges of plasma simulation methods, sources and plasma-surface interactions, underpinned by the latest modeling techniques. As guest editors of this Special Issue, we invited a group of leading plasma modelers to contribute to the issue. The SI is oriented towards influencing future modeling and simulation activities through identifying novel plasma phenomena; interpreting key experiments; promoting exchanges with experimentalists; and encouraging multidisciplinary perspectives. We believe that the complexity of low temperature plasma modeling and simulation is well suited to PPP due to its growing role in frontier areas of plasma processing, including, but certainly not limited to, polymers. The papers in this SI illustrate the scope and richness of state-of-the-art low temperature plasma modeling. Three of the papers in the SI address the topic of microplasmas using fluid models: T. Deconinck and L. L. Raja present a model of direct current microhollow cathode discharge plasmas, including the important geometric effects associated with plasma emerging from the cylindrical region at higher current. As seen experimentally, when the plasma contacts the outer flat surface, relaxation oscillations (self-pulsing) are seen in the simulation. M. Jugroot also simulates microplasmas, focusing on the initial transient breakdown phenomena. The coupling between plasma and neutral species, and the role of electrode emission properties are highlighted. N. Aggadi, M. Redolfi, X. Duten, A. Michau and K. Hassouni attack the complex and important problems associated with transient pulsed coronas in N2/O2 mixtures in a multiple-pin-to-plane configuration, coupling both experiments and modeling. These authors conclude that the key question of predicting the dynamics of active chemical species will require a fuller treatment of the entire transient corona sequence. D. Economou reports on models of fast neutral beam sources created from low pressure plasmas. Neutral beams created from ions are often strongly influenced by ion scattering from surfaces, with roughness and cleanliness playing key roles in determining the quality of the resulting neutral beam. S. Longo and P. Diomede present a particle-in-cell/Monte Carlo (PIC/MC) model of radiofrequency capacitively-coupled discharges in molecular hydrogen (H2), including negative ions and vibrationally excited molecules. Hydrogen plays an important role in many plasma applications, and the results show that the apparent simplicity of H2 is belied by its complex behavior in RF discharges. M. Capitelli, R. Celiberto, F. Esposito, and A. Laricchiuta utilize molecular dynamics to better understand and predict the vibrational state-resolved cross sections and rate coefficients in molecular gas plasmas. These authors point out that including polyatomic molecules represent a future challenge for quantum state-resolved plasma models. Molecular dynamics simulations are reported by J. Végh and D. Graves in their investigation of interactions between argon ions (Ar+) and model organic polymer surfaces. The dramatic alterations observed in the top 1 nm of the polymers simulated are a particularly clear example of how materials exposed to plasmas can be strongly modified. Finally, A. Bogaerts, E. Bultinck, M. Eckert, V. Georgieva, M. Mao, E. Neyts and L. Schwaederlé provide an overview of most of the major methods used in low temperature plasma modeling, including plasma-surface interactions. These authors review fluid, particle and hybrid particle-fluid plasma models, as well as molecular dynamics simulations for surface interactions. We are pleased to be able to offer this collection of outstanding papers in this Special Issue, and look forward to the growing role of PPP as a premier forum for broadly and comprehensively communicating all areas of low temperature plasma science and processing technology. Needless to say, we hope that this SI will convince readers that the word “Polymers” in the journal's name is not a prerequisite, and that PPP henceforth welcomes good contributions on the entire spectrum of such topics, of course including Plasma Modeling and Simulation.

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