Graphene-Quantum Dot Hybrid Photodetectors from 200 mm Wafer Scale Processing

Sha Li,Zhenxing Wang,Bianca Robertz,Daniel Neumaier,Oihana Txoperena,Arantxa Maestre,Amaia Zurutuza,Chris Bower,Ashley Rushton,Yinglin Liu,Chris Harris,Alexander Bessonov,Surama Malik,Mark Allen,Ivonne Medina-Salazar,Tapani Ryhänen,Max C. Lemme
2023-03-01
Abstract:A 200 mm processing platform for the large-scale production of graphene field-effect transistor-quantum dot (GFET-QD) hybrid photodetectors is demonstrated. Comprehensive statistical analysis of electric data shows a high yield (96%) and low variation of the 200 mm scale fabrication. The GFET-QD devices deliver responsivities of 10${^5}$ - 10${^6}$ V/W in a wavelength range from 400 to 1800 nm, at up to 100 frames per second. Spectral sensitivity compares well to that obtained using similar GFET-QD photodetectors. The device concept enables gate-tunable suppression or enhancement of the photovoltage, which may be exploited for electric shutter operation by toggling between the signal capture and shutter states. The devices show good stability at a wide operation range and external quantum efficiency of 20% in the short-wavelength infrared range. Furthermore, an integration solution with complementary metal-oxide-semiconductor technology is presented to realize image-sensor-array chips and a proof-of-concept image system. This work demonstrates the potential for the volume manufacture of infrared photodetectors for a wide range of imaging applications.
Mesoscale and Nanoscale Physics,Applied Physics
What problem does this paper attempt to address?
The paper aims to address the following issues: 1. **Mass Production**: Demonstrates a technology for mass production of graphene field-effect transistor-quantum dot (GFET-QD) hybrid photodetectors based on a 200 mm wafer platform. Comprehensive statistical analysis shows that this mass production process has a high yield (96%) and low variability. 2. **Photoelectric Performance**: GFET-QD devices exhibit a responsivity of 10^5 to 10^6 V/W in the wavelength range of 400 to 1800 nm and can operate at speeds of up to 100 frames per second. These devices can suppress or enhance the photovoltage through gate modulation, enabling electronic shutter operation. 3. **Stability and Efficiency**: The devices show good stability over a wide operating range and have an external quantum efficiency of 20% in the short-wave infrared range. 4. **Integration Technology**: Proposes a solution for integration with complementary metal-oxide-semiconductor (CMOS) technology to manufacture image sensor array chips and proof-of-concept imaging systems. This demonstrates the potential for mass production of infrared photodetectors for a wide range of imaging applications. 5. **Industrial Application Challenges**: Addresses several key challenges faced by GFET-QD photodetectors in industrial applications, including single-layer graphene chemical vapor deposition (CVD), transfer, patterning, and large-area deposition of multilayer quantum dot absorbing materials in an inert atmosphere. In summary, the paper demonstrates the successful integration of quantum dot-functionalized GFETs with CVD graphene on a 200 mm CMOS wafer platform, paving the way for the mass production of infrared photodetectors.