Abstract:Turing's reaction-diffusion theory of morphogenesis has been very successful in understanding macroscopic patterns within complex objects ranging from biological systems to sand dunes. However, this mechanism was never tested against patterns that emerge at the atomic scale, where the basic ingredients are subject to constraints imposed by quantum mechanics. Here we report evidence of a Turing pattern that appears in a strained atomic bismuth monolayer assembling on the surface of NbSe$_2$ subject to interatomic interactions and respective kinetics. The narrow range of microscopic parameters reflected in numerical analysis that observe stripe patterns and domain walls with Y-shaped junctions is a direct consequence of the quantum-mechanically allowed bond-lengths and bond-angles. This is therefore the first demonstration of a dynamically formed Turing pattern at the atomic scale.

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to verify the validity of Turing's reaction - diffusion theory at the atomic scale and to explain the origin and mechanism of the mysterious patterns formed when a bismuth (Bi) monolayer grows on the surface of niobium diselenide (NbSe₂). Specifically, Turing's reaction - diffusion theory has successfully explained the formation of macroscopic patterns in complex objects ranging from biological systems to sand dunes. However, this theory has never been used to describe patterns emerging at the atomic scale because, at this scale, the constraints of quantum mechanics have an impact on the basic components. Therefore, researchers hope to verify through experimental and theoretical analysis whether Turing patterns can be formed at the atomic scale and explore the physical mechanisms behind them. ### Main problems include: 1. **Feasibility of Turing patterns at the atomic scale**: - This research aims to verify whether Turing patterns can be formed at the atomic scale and how quantum mechanics affects the formation of such patterns. 2. **Mysterious patterns of bismuth monolayer**: - Researchers have observed that the bismuth monolayer forms a striped pattern with a period of five atoms (about 1.7 nanometers) and domain walls with Y - shaped junctions on the NbSe₂ surface. These patterns break the symmetry of the underlying lattice and are similar to the striped patterns on the skin of angelfish, although their length scales differ by six orders of magnitude. 3. **Formation conditions of Turing patterns**: - The necessary conditions for forming Turing patterns include autocatalysis and cross - catalysis between activators and inhibitors, and the diffusion rate of inhibitors being much faster than that of activators ($ D_a \ll D_h $). Researchers need to determine what the activators and inhibitors are in this case, why their diffusion rates are so different, and how the wavelength is determined. 4. **Dynamic characteristics**: - The research also explores the dynamic characteristics of these patterns, such as the wound - healing ability and the possibility of controlling the domain structure by applying uniaxial strain. ### Research methods: - **Molecular beam epitaxy (MBE) growth**: Grow a bismuth monolayer on the NbSe₂ surface by MBE technology. - **Numerical simulation**: Use the reaction - diffusion equation for numerical simulation to verify the consistency between the theoretical model and the experimental results. - **Linear stability analysis**: Determine the most unstable wavenumber $ k_m = a^{-1} \sqrt{\frac{K_a}{K_b}}^{1/4} $ through linear stability analysis, thereby explaining the internal parameter dependence of the wavelength. ### Conclusion: This research shows for the first time the dynamic Turing patterns formed at the atomic scale and proves the validity of Turing's reaction - diffusion theory at the nanoscale through experimental and theoretical analysis. This not only expands the application range of Turing patterns but also provides new ideas for designing new materials and exploring new physical phenomena.

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