Energy-level Alignment at Strongly Coupled Organic–metal Interfaces
Meng-Ting Chen,Oliver T. Hofmann,Alexander Gerlach,Benjamin Broeker,Christoph Buerker,Jens Niederhausen,Takuya Hosokai,Joerg Zegenhagen,Antje Vollmer,Ralph Riegel,Klaus Muellen,Frank Schreiber,Ingo Salzmann,Norbert Koch,Egbert Zojer,Steffen Duhm
DOI: https://doi.org/10.1088/1361-648x/ab0171
2019-01-01
Journal of Physics Condensed Matter
Abstract:Energy-level alignment at organic-metal interfaces plays a crucial role for the performance of organic electronic devices. However, reliable models to predict energetics at strongly coupled interfaces are still lacking. We elucidate contact formation of 1,2,5,6,9,10-coronenehexone (COHON) to the (1 1 1)-surfaces of coinage metals by means of ultraviolet photoelectron spectroscopy, x-ray photoelectron spectroscopy, the x-ray standing wave technique, and density functional theory calculations. While for low COHON thicknesses, the work-functions of the systems vary considerably, for thicker organic films Fermi-level pinning leads to identical work functions of 5.2 eV for all COHON-covered metals irrespective of the pristine substrate work function and the interfacial interaction strength.