Improved graphene blisters by ultrahigh pressure sealing

Y. Manzanares-Negro,P. Ares,M. Jaafar,G. López-Polín,C. Gómez-Navarro,J. Gómez-Herrero

DOI: https://doi.org/10.1021/acsami.0c09765

2020-08-11

Abstract:Graphene is a very attractive material for nanomechanical devices and membrane applications. Graphene blisters based on silicon oxide micro-cavities are a simple but relevant example of nanoactuators. A drawback of this experimental set up is that gas leakage through the graphene-SiO2 interface contributes significantly to the total leak rate. Here we study the diffusion of air from pressurized graphene drumheads on SiO2 micro-cavities and propose a straightforward method to improve the already strong adhesion between graphene and the underlying SiO2 substrate, resulting in reduced leak rates. This is carried out by applying controlled and localized ultrahigh pressure (> 10 GPa) with an Atomic Force Microscopy diamond tip. With this procedure, we are able to significantly approach the graphene layer to the SiO2 surface around the drumheads, thus enhancing the interaction between them allowing us to better seal the graphene-SiO2 interface, which is reflected in up to ~ 4 times lower leakage rates. Our work opens an easy way to improve the performance of graphene as a gas membrane on a technological relevant substrate such as SiO2.

Materials Science

What problem does this paper attempt to address?

### Problems Addressed by the Paper

The paper aims to address the issue of gas leakage in graphene bubbles within silicon dioxide (SiO₂) microcavities. Specifically, researchers have found that the interface between graphene and the SiO₂ substrate is the main pathway for gas leakage. Although graphene itself has extremely high impermeability, the weak adhesion between graphene and the SiO₂ substrate leads to a high leakage rate. This limits the performance of graphene in nano-mechanical devices and membrane applications.

### Solution

To improve this issue, researchers proposed a simple and effective method: applying local ultra-high pressure (> 10 GPa) using the diamond tip of an atomic force microscope (AFM) to enhance the adhesion between graphene and the SiO₂ substrate. This method can significantly reduce gas diffusion through the interface, thereby lowering the leakage rate. Experimental results show that after this treatment, the leakage rate is reduced by approximately 4 times.

### Experimental Methods

1. **Sample Preparation**: Graphene drumheads were prepared by mechanically exfoliating natural graphite onto SiO₂/Si substrates with predefined circular holes (diameter ranging from 0.5 to 3 μm).
2. **AFM Imaging**: Imaging was performed using an atomic force microscope in a variable pressure chamber, applying a pressure difference by controlling the internal pressure (P_in) and external pressure (P_out) of the microcavity.
3. **Ultra-High Pressure Treatment**: Local ultra-high pressure was applied at the edges of the microcavity using the diamond tip of the AFM to enhance the adhesion between graphene and the SiO₂ substrate.
4. **Leakage Rate Measurement**: The leakage rate was assessed by long-term monitoring of the drumhead morphology changes in AFM images.

### Conclusion

The research results indicate that local ultra-high pressure treatment can significantly improve the adhesion between graphene and the SiO₂ substrate, effectively reducing the gas leakage rate. This method provides a new improvement pathway for graphene-based nano-mechanical devices and membrane applications.