Abstract:Extreme ultraviolet (EUV) light source is an important part of EUV lithography system in semiconductor manufacturing. The EUV light source requires that the 4p 6 4d n -4p 5 4d n +1 + 4d n -1 4f transitions of Sn 8+~13+ ions emit thousands of lines which form unresolved transition arrays near 13.5 nm. Laser-induced discharge plasma is one of the important technical means to excite target into an appropriate plasma condition. Laser-induced discharge plasma has a simple structure and a low cost. It also has important applications in mask inspection, microscopic imaging, and spectral metrology. In the design and production process, there are many factors that can influence the conversion efficiency, such as current, electrode shape, and laser power density. The simulation method is a convenient way to provide guidance for optimizing the parameters. In this paper, a completed radiation magneto-hydrodynamic model is used to explore the dynamic characteristics of laser-induced discharge plasma and its EUV radiation characteristics. To improve the accuracy, a more detailed global equation of state model, an atomic structure calculation model including relativistic effect and a collision radiation model are proposed simultaneously. The simulation reconstructs the discharge process effectively, which is divided into five stages in the first half cycle of current, including expansion of laser plasma, column formation of discharge plasma, diffusion of discharge plasma, contraction of discharge plasma, and re-diffusion of discharge plasma. It is revealed that the pinch effect during the current rising time exerts a significant influence on the generation of EUV radiation. The conversion efficiency of EUV radiation is still low under our existing conditions, and hopefully a higher rising rate of current can improve the conversion efficiency in the future work.

Ultimate efficiency of extreme ultraviolet radiation from a laser-produced plasma

Efficient extreme ultraviolet emission by multiple laser pulses

Influence of a laser intensity on EUV brightness and ion speed from a laser-assisted discharge-produced plasma

Ultra-intense femtosecond laser interactions with ordered nanostructures

Focus Optimization Of Relativistic Self-Focusing For Anomalous Laser Penetration Into Overdense Plasmas (Super-Penetration)

The Effects Of Plasma Density-Gradient On Laser-Driven Transmitted Emission

Enhanced focusing of relativistic lasers by plasma lens with exponentially increasing density profiles

Plasma devices for focusing extreme light pulses

Homogeneous, Micron-Scale High-Energy-Density Matter Generated by Relativistic Laser-Solid Interactions

Relativistic Laser Channeling into High-Density Plasmas

Observation of high efficiency Betatron radiation from femtosecond petawatt laser irradiated near critical plasmas

A Laser-Produced Plasma Source Based on Thin-Film Gd Targets for Next-Generation Extreme Ultraviolet Lithography

Particle-in-cell simulations of high energy electron production by intense laser pulses in underdense plasmas

Preplasma Effects on the Generation of High-Energy Protons in Ultraintense Laser Interaction with Foil Targets

Enhancement and spatial characteristics of kα x-ray emission from high-contrast relativistic fs laser plasmas

Theoretical investigation of the interaction of ultra-high intensity laser pulses with near critical density plasmas

Electron density and energy output limits of plasma‐recombination lasers

Direct Acceleration of Solid-Density Plasma Bunch by Ultraintense Laser

Simulation of extreme ultraviolet radiation of laser induced discharge plasma

Hard X-Ray Emission from Intense Femtosecond Laser-Solid Target Interactions

Compression of high-power laser pulse leads to increase of electron acceleration efficiency