Aluminum-ion-intercalation nickel oxide thin films for high-performance electrochromic energy storage devices

Hongliang Zhang,Sheng Liu,Tao Xu,Weiping Xie,Guoxin Chen,Lingyan Liang,Junhua Gao,Hongtao Cao
DOI: https://doi.org/10.1039/d1tc04240h
IF: 6.4
2021-01-01
Journal of Materials Chemistry C
Abstract:Unleashing the true merits of aluminum-ion-intercalation nickel oxide thin films for EESDs by taking a closer look at the optical modulation, energy storage, and diffusion and reaction kinetics of the NiO/Al 3+ system.
materials science, multidisciplinary,physics, applied
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