Phase-sensitive bichromatic photoresistance in a two-dimensional electron gas

Q. Shi,M. Khodas,A. Levchenko,M. A. Zudov
DOI: https://doi.org/10.1103/PhysRevB.88.245409
2013-12-12
Abstract:We have studied microwave photoresistance in a two-dimensional electron system subject to two radiation fields (frequencies $\omega_1$ and $\omega_2$) using quantum kinetic equation. We have found that when $\omega_2/\omega_1= 1 + 2/N$, where $N$ is an integer, and both waves have the same polarization, the displacement mechanism gives rise to a new, phase-sensitive photoresistance. This photoresistance oscillates with the magnetic field and can be a good fraction of the total photoresistance under typical experimental conditions. The inelastic mechanism, on the other hand, gives zero phase-sensitive photoresistance if the radiation fields are circularly polarized.
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
The problem that this paper attempts to solve is: in a two - dimensional electron gas system, when subjected to microwave radiation fields of two different frequencies (with frequencies of \(\omega_1\) and \(\omega_2\) respectively), how to explain and predict the new phase - sensitive two - color photoresistance phenomenon. Specifically, the author has studied these conditions and discovered a new phase - sensitive photoresistance mechanism through the quantum equation of motion. ### Main problem decomposition: 1. **Background and motivation**: - Previous research has mainly focused on monochromatic excitation (i.e., microwave radiation of a single frequency), and the observed phenomena include microwave - induced resistance oscillations (MIROs) and zero - resistance states (ZRSs). - Two - color excitation (i.e., the simultaneous action of two microwave radiation fields of different frequencies) has shown important effects in other fields such as chemistry, semiconductor physics, atomic physics, and nonlinear optics, but relatively few studies have been carried out in two - dimensional electron gas systems. 2. **Specific problems**: - When the two microwave radiation fields have the same polarization and the frequency ratio is \(\omega_2/\omega_1 = 1+ 2/N\) (where \(N\) is an integer), is there a new phase - sensitive photoresistance? - Can this phase - sensitive photoresistance be detected experimentally, and what proportion does it account for in the total photoresistance? ### Key points of the solution: - **Phase - sensitive mechanism**: - The author analyzed two different mechanisms through the quantum equation of motion: the displacement mechanism and the inelastic mechanism. - The results show that in the inelastic mechanism, the phase - sensitive photoresistance is zero; while in the displacement mechanism, when the two microwave fields have the same polarization and the frequencies satisfy a specific relationship, there is a non - zero phase - sensitive photoresistance. - **Mathematical model**: - The author derived a formula to describe this phase - sensitive photoresistance and pointed out that in the simplest case (\(\omega_2/\omega_1 = 3\)), the phase - sensitive term is maximized near the semi - integer value of \(\epsilon=\omega_1/\omega_c\) and minimized near the integer value. - The formula is as follows: \[ \frac{\delta \rho_{12}(\theta)}{\rho_D}=\frac{5}{48}\frac{\tau}{\tilde{\tau}}\lambda^2R_1^3R_2F(2\pi\epsilon)\cos\theta \] where \(\rho_D\) is the Drude resistivity, \(F(x)\) is a function containing three oscillation terms, and \(\theta\) is the relative phase difference between the two microwave fields. - **Experimental significance**: - The research shows that this phase - sensitive photoresistance effect can be used to distinguish between the displacement mechanism and the inelastic mechanism, thus providing a new tool for experiments. - Under typical experimental conditions, the phase - sensitive photoresistance can account for a considerable proportion (more than 25%) of the total photoresistance, which makes it have important application prospects in experiments. In conclusion, through theoretical analysis and mathematical modeling, this paper reveals a new phase - sensitive photoresistance mechanism in a two - dimensional electron gas system under the action of two - color microwave radiation and provides a theoretical basis for its experimental verification.