Abstract:Moving meniscus-assisted vertical lifting is a commonly employed particle assembly technique to realize large-area particle patterning for the easy fabrication of colloidal photonic crystals and sensors. Though great success has been achieved for large-area patterning, inscribing desired patterns over the target substrate with precise control over the morphology remains a challenge. The target substrates need to be functionalized (physically or chemically) to realize desired patterns, which increases the complexity and limits their applicability to specific particle-liquid combinations. We demonstrate a new approach for the precise patterning of gold nanoparticles (Au NPs, diameter ∼60 nm) over solid substrates by the synergy of light-induced Marangoni flow and vertical lifting process (moving meniscus), without the requirement of photomasks or templates. The core idea relies on the particle accumulation due to light-induced Marangoni flow near the liquid meniscus in contact with a solid surface (due to plasmonic absorption of the particles) and the controlled lifting of the substrate. We present both the simulation and experimental results of the developed patterning technique. Various patterns such as continuous lines, intermittent lines with varying lengths, patterns with continuously varying widths, cross patterns, etc. are successfully inscribed. Dynamic control over the three-dimensional morphology of the deposited patterns is achieved by varying the lifting velocity, laser irradiation time, and lifting direction during the inscription process. Finally, we show the applicability of the developed plasmonically active surface for the large-area parallel manipulation of nonabsorbing microparticles based on optothermoconvective flow. The major advantage of the developed method compared to the existing light-controlled patterning techniques is its ability to inscribe patterns over large distances (up to several centimeters). We expect that the results presented in this paper will benefit different applications requiring precise particle patterning, such as optical elements, sensors, plasmonic substrates, microfluidic master templates, and electronic circuits.

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