Potential thermoelectric performance of hole-doped Cu2O

Xin Chen,David Parker,Mao-Hua Du,David J. Singh
DOI: https://doi.org/10.1088/1367-2630/15/4/043029
2013-01-06
Abstract:High thermoelectric performance in oxides requires stable conductive materials that have suitable band structures. Here we show based on an analysis of the thermopower and related properties using first-principles calculations and Boltzmann transport theory that hole doped Cu2O may be such a material. We find that hole-doped Cu2O has a high thermopower of above 200 microV/K even with doping levels as high as 5.5x10 20 cm-3 at 500 K, mainly attributed to the heavy valence bands of Cu2O. This is reminiscent of the cobaltate family of high performance oxide thermoelectrics and implies that hole-doped Cu2O could be an excellent thermoelectric material if suitably doped.
Materials Science
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