Reduced basis method for computational lithography

J. Pomplun,L. Zschiedrich,S. Burger,F. Schmidt
DOI: https://doi.org/10.1117/12.829639
2010-11-11
Abstract:A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usually the same basic layout has to be simulated multiple times for different values of geometrical parameters. The reduced basis method allows to split up the solution process of a parameterized model into an expensive offline and a cheap online part. After constructing the reduced basis offline, the reduced model can be solved online very fast in the order of seconds or below. Error estimators assure the reliability of the reduced basis solution and are used for self adaptive construction of the reduced system. We explain the idea of reduced basis and use the finite element solver JCMsuite constructing the reduced basis system. We present a 3D optimization application from optical proximity correction (OPC).
Optics,Computational Physics
What problem does this paper attempt to address?
This paper attempts to address the problem of long computation times for near-field simulations in computational lithography and optical metrology. During design, optimization, and inverse scattering measurements, it is often necessary to simulate the same baseline layout multiple times to test different geometric parameters (such as linewidth, absorption edge angle, etc.). Each simulation can be very time-consuming, which limits the possibility of multi-query and real-time applications. To solve this problem, the paper proposes the "Reduced Basis Method" (RBM), which divides the solution process into an expensive offline part and a cheap online part. By pre-constructing a reduced basis space, the online part can be solved quickly, significantly reducing computation time. Additionally, an error estimator ensures the reliability and accuracy of the reduced basis solution and is used to adaptively construct the reduced basis system. Specifically, the main contributions of the paper include: 1. **Introduction of the Reduced Basis Method**: Explains the basic idea of the reduced basis method and its application in electromagnetic scattering problems. 2. **Mathematical Framework**: Describes in detail the mathematical setup of the input-output relationship and how to use the finite element method to solve electromagnetic scattering problems. 3. **Construction of the Reduced Basis Space**: Introduces how to construct the reduced basis space by selecting snapshot parameters through a greedy algorithm. 4. **Online-Offline Decomposition**: Explains how to decompose the assembly steps into offline and online parts through affine decomposition to improve computational efficiency. 5. **Error Estimation**: Proposes methods for error estimation to ensure the reliability of the reduced basis solution. 6. **Numerical Examples**: Demonstrates the effectiveness of the reduced basis method through an example of an Optical Proximity Correction (OPC) optimization problem. The results show that using the reduced basis method can reduce computation time from several thousand seconds to a few seconds, with a speedup of approximately 8000 times. In summary, this paper aims to solve the problem of long computation times in computational lithography and optical metrology through the reduced basis method, providing an effective solution for multi-query and real-time applications.