Fabrication of High Aspect Ratio Micro-Structures with Superhydrophobic and Oleophobic Properties by Using Large-Area Roll-to-Plate Nanoimprint Lithography
Nithi Atthi,Marc Dielen,Witsaroot Sripumkhai,Pattaraluck Pattamang,Rattanawan Meananeatra,Pawasuth Saengdee,Oraphan Thongsook,Norabadee Ranron,Krynnaras Pankong,Warinrampai Uahchinkul,Jakrapong Supadech,Nipapan Klunngien,Wutthinan Jeamsaksiri,Pim Veldhuizen,Jan Matthijs ter Meulen
DOI: https://doi.org/10.3390/nano11020339
IF: 5.3
2021-01-29
Nanomaterials
Abstract:Bio-inspired surfaces with superamphiphobic properties are well known as effective candidates for antifouling technology. However, the limitation of large-area mastering, patterning and pattern collapsing upon physical contact are the bottleneck for practical utilization in marine and medical applications. In this study, a roll-to-plate nanoimprint lithography (R2P NIL) process using Morphotonics’ automated Portis NIL600 tool was used to replicate high aspect ratio (5.0) micro-structures via reusable intermediate flexible stamps that were fabricated from silicon master molds. Two types of Morphotonics’ in-house UV-curable resins were used to replicate a micro-pillar (PIL) and circular rings with eight stripe supporters (C-RESS) micro-structure onto polycarbonate (PC) and polyethylene terephthalate (PET) foil substrates. The pattern quality and surface wettability was compared to a conventional polydimethylsiloxane (PDMS) soft lithography process. It was found that the heights of the R2P NIL replicated PIL and C-RESS patterns deviated less than 6% and 5% from the pattern design, respectively. Moreover, the surface wettability of the imprinted PIL and C-RESS patterns was found to be superhydro- and oleophobic and hydro- and oleophobic, respectively, with good robustness for the C-RESS micro-structure. Therefore, the R2P NIL process is expected to be a promising method to fabricate robust C-RESS micro-structures for large-scale anti-biofouling application.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry