Anomalous diffusion mediated by atom deposition into a porous substrate

Pascal Brault,Christophe Josserand,Jean-Marc Bauchire,Amael Caillard,Christine Charles,Rod W. Boswell
DOI: https://doi.org/10.1103/PhysRevLett.102.045901
2009-02-16
Abstract:Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time
Statistical Mechanics
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