Atomic Layer Deposition of TiO 2 on Si Window Enables In Situ ATR-SEIRAS Measurements in Strong Alkaline Electrolytes

Wei-Yi Zhang,Xian-Yin Ma,Tian-Wen Jiang,Xindi Xu,Baoxin Ni,Bin Chen,Yunyu Wang,Kun Jiang,Wen-Bin Cai
DOI: https://doi.org/10.1021/acs.analchem.4c01985
IF: 7.4
2024-06-14
Analytical Chemistry
Abstract:The Si window is the most widely used internal reflection element (IRE) for electrochemical attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS), yet local chemical etching on Si by concentrated OH^(-) anions bottlenecks the reliable application of this method in strong alkaline electrolytes. In this report, atomic layer deposition of a 25 nm nonconductive TiO(2) barrier layer on the reflecting plane of a Si prism is demonstrated to address this challenge....
chemistry, analytical
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