Conformational rearrangements in thin films of polydimethylsiloxane melt

Guennadi Evmenenko,Haiding Mo,Sumit Kewalramani,Pulak Dutta
DOI: https://doi.org/10.1016/j.polymer.2005.12.010
2005-10-27
Abstract:Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60A) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 hours for higher molecular weights (close to and above their entanglement value).
Soft Condensed Matter
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